dc.contributor.author | Javanainen, Arto | |
dc.contributor.author | Turowski, Marek | |
dc.contributor.author | Galloway, Kenneth F. | |
dc.contributor.author | Nicklaw, Christopher | |
dc.contributor.author | Ferlet-Cavrois, Véronique | |
dc.contributor.author | Bosser, Alexandre | |
dc.contributor.author | Lauenstein, Jean-Marie | |
dc.contributor.author | Muschitiello, Michele | |
dc.contributor.author | Pintacuda, Francesco | |
dc.contributor.author | Reed, Robert A. | |
dc.contributor.author | Schrimpf, Ronal D. | |
dc.contributor.author | Weller, Robert A. | |
dc.contributor.author | Virtanen, Ari | |
dc.date.accessioned | 2017-08-30T09:59:36Z | |
dc.date.available | 2017-08-30T09:59:36Z | |
dc.date.issued | 2017 | |
dc.identifier.citation | Javanainen, A., Turowski, M., Galloway, K. F., Nicklaw, C., Ferlet-Cavrois, V., Bosser, A., Lauenstein, J.-M., Muschitiello, M., Pintacuda, F., Reed, R. A., Schrimpf, R. D., Weller, R. A., & Virtanen, A. (2017). Heavy-Ion-Induced Degradation in SiC Schottky Diodes : Incident Angle and Energy Deposition Dependence. <i>IEEE Transactions on Nuclear Science</i>, <i>64</i>(8), 2031-2037. <a href="https://doi.org/10.1109/TNS.2017.2717045" target="_blank">https://doi.org/10.1109/TNS.2017.2717045</a> | |
dc.identifier.other | CONVID_27080889 | |
dc.identifier.uri | https://jyx.jyu.fi/handle/123456789/55216 | |
dc.description.abstract | Heavy-ion-induced degradation in the reverse leakage current of SiC Schottky power diodes exhibits a strong dependence on the ion angle of incidence. This effect is studied experimentally for several different bias voltages applied during heavy-ion exposure. In addition, TCAD simulations are used to give insight on the physical mechanisms involved. | |
dc.language.iso | eng | |
dc.publisher | Institute of Electrical and Electronics Engineers | |
dc.relation.ispartofseries | IEEE Transactions on Nuclear Science | |
dc.subject.other | ion radiation effects | |
dc.subject.other | modeling | |
dc.subject.other | power semiconductor devices | |
dc.subject.other | schottky diodes | |
dc.subject.other | silicon carbide | |
dc.title | Heavy-Ion-Induced Degradation in SiC Schottky Diodes : Incident Angle and Energy Deposition Dependence | |
dc.type | research article | |
dc.identifier.urn | URN:NBN:fi:jyu-201708243552 | |
dc.contributor.laitos | Fysiikan laitos | fi |
dc.contributor.laitos | Department of Physics | en |
dc.contributor.oppiaine | Kiihdytinlaboratorio | fi |
dc.contributor.oppiaine | Accelerator Laboratory | en |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | |
dc.date.updated | 2017-08-24T09:15:04Z | |
dc.type.coar | http://purl.org/coar/resource_type/c_2df8fbb1 | |
dc.description.reviewstatus | peerReviewed | |
dc.format.pagerange | 2031-2037 | |
dc.relation.issn | 0018-9499 | |
dc.relation.numberinseries | 8 | |
dc.relation.volume | 64 | |
dc.type.version | acceptedVersion | |
dc.rights.copyright | © 2017 IEEE. This is a final draft version of an article whose final and definitive form has been published by IEEE. Published in this repository with the kind permission of the publisher. | |
dc.rights.accesslevel | openAccess | fi |
dc.type.publication | article | |
dc.subject.yso | ionit | |
dc.subject.yso | pii | |
dc.subject.yso | diodit | |
dc.subject.yso | säteily | |
dc.subject.yso | mallintaminen | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p9015 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p15609 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p13006 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p4150 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p3533 | |
dc.relation.doi | 10.1109/TNS.2017.2717045 | |
dc.type.okm | A1 | |