Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films
Napari, M., Huq, T. N., Maity, T., Gomersall, D., Niang, K. M., Barthel, A., Thompson, J. E., Kinnunen, S., Arstila, K., Sajavaara, T., Hoye, R. L. Z., Flewitt, A. J., & MacManus-Driscoll, J. L. (2020). Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films. InfoMat, 2(4), 769-774. https://doi.org/10.1002/inf2.12076
Published in
InfoMatAuthors
Date
2020Discipline
Ydin- ja kiihdytinfysiikan huippuyksikköFysiikkaKiihdytinlaboratorioCentre of Excellence in Nuclear and Accelerator Based PhysicsPhysicsAccelerator LaboratoryCopyright
© 2020 The Authors. InfoMat published by John Wiley & Sons Australia, Ltd on behalf of UESTC.
Publisher
John Wiley & SonsISSN Search the Publication Forum
2567-3165Keywords
Publication in research information system
https://converis.jyu.fi/converis/portal/detail/Publication/34408538
Metadata
Show full item recordCollections
Additional information about funding
M.N. and J.L. M.-D. acknowledge funding from the EPSRC grant EP/ P027032/1. T.N.H. acknowledges funding from the EPSRC Centre for Doctoral Training in Graphene Technology (No. EP/L0160871) and Aziz Foundation. T.M. and J.L.M.-D. acknowledge funding from EU grant H2020MSCA-IF-2016 745886 MuStMAM and Isaac Newton Trust (RG96474). R.L.Z.H. acknowledges funding from the Royal Academy of Engineering via the Research Fellowship scheme (No.: RF/201718/17101), as well as support from Magdalene College Cambridge. ...License
Related items
Showing items with similar title or keywords.
-
Cellulose-inorganic hybrids of strongly reduced thermal conductivity
Spiliopoulos, Panagiotis; Gestranius, Marie; Zhang, Chao; Ghiyasi, Ramin; Tomko, John; Arstila, Kai; Putkonen, Matti; Hopkins, Patrick E.; Karppinen, Maarit; Tammelin, Tekla; Kontturi, Eero (Springer Science and Business Media LLC, 2022)The employment of atomic layer deposition and spin coating techniques for preparing inorganic–organic hybrid multilayer structures of alternating ZnO-CNC layers was explored in this study. Helium ion microscopy and X-ray ... -
Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
Broas, Mikael; Sippola, Perttu; Sajavaara, Timo; Vuorinen, Vesa; Perros, Alexander Pyymaki; Lipsanen, Harri; Paulasto-Kröckel, Mervi (American Institute of Physics, 2016)Plasma-enhanced atomic layer deposition was utilized to grow aluminum nitride (AlN) films on Si from trimethylaluminum and N2:H2 plasma at 200 °C. Thermal treatments were then applied on the films which caused changes in ... -
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
Napari, Mari (University of Jyväskylä, 2017)Atomic layer deposition (ALD) is a method for thin film fabrication with atomic level precision. This thesis focuses on low-temperature thermal and plasma- enhanced ALD and presents results on thin film growth by these ... -
Tribological properties of thin films made by atomic layer deposition sliding against silicon
Kilpi, Laura; Ylivaara, Oili M. E.; Vaajoki, Antti; Liu, Xuwen; Rontu, Ville; Sintonen, Sakari; Haimi, Eero; Malm, Jari; Bosund, Markus; Tuominen, Marko; Sajavaara, Timo; Lipsanen, Harri; Hannula, Simo-Pekka; Puurunen, Riikka L.; Ronkainen, Helena (AIP Publishing LLC, 2018)Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for ... -
Phosphites as precursors in atomic layer deposition thin film synthesis
Kvamme, Kristian B.; Ruud, Amund; Weibye, Kristian; Sajavaara, Timo; Nilsen, Ola (American Institute of Physics, 2021)We here demonstrate a new route for deposition of phosphorous based materials by atomic layer deposition (ALD) using the phosphites Me3PO3 or Et3PO3 as precursors. These contain phosphorous in the oxidation state (III) and ...