Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films

Napari, Mari; Huq, Tahmida N.; Maity, Tuhin; Gomersall, Daisy; Niang, Kham M.; Barthel, Armin; Thompson, Juliet E.; Kinnunen, Sami; Arstila, Kai; Sajavaara, Timo; Hoye, Robert L. Z.; Flewitt, Andrew J.; MacManus-Driscoll, Judith L.

doi:10.1002/inf2.12076

dc.contributor.author	Napari, Mari
dc.contributor.author	Huq, Tahmida N.
dc.contributor.author	Maity, Tuhin
dc.contributor.author	Gomersall, Daisy
dc.contributor.author	Niang, Kham M.
dc.contributor.author	Barthel, Armin
dc.contributor.author	Thompson, Juliet E.
dc.contributor.author	Kinnunen, Sami
dc.contributor.author	Arstila, Kai
dc.contributor.author	Sajavaara, Timo
dc.contributor.author	Hoye, Robert L. Z.
dc.contributor.author	Flewitt, Andrew J.
dc.contributor.author	MacManus-Driscoll, Judith L.
dc.date.accessioned	2020-04-01T03:59:28Z
dc.date.available	2020-04-01T03:59:28Z
dc.date.issued	2020
dc.identifier.citation	Napari, M., Huq, T. N., Maity, T., Gomersall, D., Niang, K. M., Barthel, A., Thompson, J. E., Kinnunen, S., Arstila, K., Sajavaara, T., Hoye, R. L. Z., Flewitt, A. J., & MacManus-Driscoll, J. L. (2020). Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films. <i>InfoMat</i>, <i>2</i>(4), 769-774. <a href="https://doi.org/10.1002/inf2.12076" target="_blank">https://doi.org/10.1002/inf2.12076</a>
dc.identifier.other	CONVID_34408538
dc.identifier.uri	https://jyx.jyu.fi/handle/123456789/68402
dc.format.mimetype	application/pdf
dc.language	eng
dc.language.iso	eng
dc.publisher	John Wiley & Sons
dc.relation.ispartofseries	InfoMat
dc.rights	CC BY 4.0
dc.subject.other	atomic layer deposition
dc.subject.other	chemical vapor deposition
dc.subject.other	nickel oxide
dc.subject.other	solution deposition
dc.subject.other	thin films
dc.title	Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films
dc.type	research article
dc.identifier.urn	URN:NBN:fi:jyu-202004012616
dc.contributor.laitos	Fysiikan laitos	fi
dc.contributor.laitos	Department of Physics	en
dc.contributor.oppiaine	Ydin- ja kiihdytinfysiikan huippuyksikkö	fi
dc.contributor.oppiaine	Fysiikka	fi
dc.contributor.oppiaine	Kiihdytinlaboratorio	fi
dc.contributor.oppiaine	Centre of Excellence in Nuclear and Accelerator Based Physics	en
dc.contributor.oppiaine	Physics	en
dc.contributor.oppiaine	Accelerator Laboratory	en
dc.type.uri	http://purl.org/eprint/type/JournalArticle
dc.type.coar	http://purl.org/coar/resource_type/c_2df8fbb1
dc.description.reviewstatus	peerReviewed
dc.format.pagerange	769-774
dc.relation.issn	2567-3165
dc.relation.numberinseries	4
dc.relation.volume	2
dc.type.version	publishedVersion
dc.rights.copyright	© 2020 The Authors. InfoMat published by John Wiley & Sons Australia, Ltd on behalf of UESTC.
dc.rights.accesslevel	openAccess	fi
dc.type.publication	article
dc.subject.yso	ohutkalvot
dc.subject.yso	kemialliset reaktiot
dc.subject.yso	kemialliset ilmiöt
dc.subject.yso	atomikerroskasvatus
dc.format.content	fulltext
jyx.subject.uri	http://www.yso.fi/onto/yso/p16644
jyx.subject.uri	http://www.yso.fi/onto/yso/p3658
jyx.subject.uri	http://www.yso.fi/onto/yso/p3656
jyx.subject.uri	http://www.yso.fi/onto/yso/p27468
dc.rights.url	https://creativecommons.org/licenses/by/4.0/
dc.relation.doi	10.1002/inf2.12076
jyx.fundinginformation	M.N. and J.L. M.-D. acknowledge funding from the EPSRC grant EP/ P027032/1. T.N.H. acknowledges funding from the EPSRC Centre for Doctoral Training in Graphene Technology (No. EP/L0160871) and Aziz Foundation. T.M. and J.L.M.-D. acknowledge funding from EU grant H2020MSCA-IF-2016 745886 MuStMAM and Isaac Newton Trust (RG96474). R.L.Z.H. acknowledges funding from the Royal Academy of Engineering via the Research Fellowship scheme (No.: RF/201718/17101), as well as support from Magdalene College Cambridge.
dc.type.okm	A1

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