dc.contributor.author | Laitinen, Pauli | |
dc.date.accessioned | 2008-03-03T11:16:24Z | |
dc.date.available | 2008-03-03T11:16:24Z | |
dc.date.issued | 2004 | |
dc.identifier.isbn | 978-951-39-3150-6 | |
dc.identifier.other | oai:jykdok.linneanet.fi:1053255 | |
dc.identifier.uri | https://jyx.jyu.fi/handle/123456789/13920 | |
dc.format.extent | 57 sivua | |
dc.language.iso | eng | |
dc.publisher | University of Jyväskylä | |
dc.relation.ispartofseries | Research report / Department of Physics, University of Jyväskylä | |
dc.relation.haspart | <b>Artikkeli I</b> Laitinen, P., Touboltsev, V., Tyurin, G., & Räisänen, J. (2002). Detection system for depth profiling of radiotracers. <i>Nuclear Instruments and Methods, B 190, 183.</i> DOI: <a href="https://doi.org/10.1016/s0168-583x(01)01205-8"target="_blank"> 10.1016/s0168-583x(01)01205-8</a> | |
dc.relation.haspart | <i<Artikkeli II:</i> Laitinen, P., Nevala, M., Pirojenko, A., Ranttila, K., Seppälä, R., Riihimäki, I., Räisänen, J., & Virtanen, A. (2004). Utilisation of a sputtering device for targetry and diffusion studies. <i>Nuclear Instruments and Methods in Physics Research. Section B, 226(3), 441-446.</i> DOI: <a href="http://dx.doi.org/10.1016/j.nimb.2004.06.027"target="_blank"> 10.1016/j.nimb.2004.06.027</a> | |
dc.relation.haspart | <b>Artikkeli III:</b> Strohm, A., Voss, T., Frank, W., Laitinen, P., & Räisänen, J. (2002). Self-diffusion of 71Ge and 31Si in Si-Ge alloys. <i>Zeitschrift für Metallkunde, 93, 737.</i> DOI: <a href="https://doi.org/10.3139/146.020737"target="_blank"> 10.3139/146.020737</a> | |
dc.relation.haspart | <b>Artikkeli IV:</b> Räisänen, J., Dendooven, P., Laitinen, P., Huikari, J., Nieminen, A., Riihimäki, I., Äystö, J., Strohm, A., Grodon, C., & Frank, W. (2002). Self-Diffusion of 31Si and 71Ge in relaxed Si0.20Ge0.80 layers. <i>Physical review letters, 89, Article 085902.</i> DOI: <a href="https://doi.org/10.1103/PhysRevLett.89.085902"target="_blank"> 10.1103/PhysRevLett.89.085902</a> | |
dc.relation.haspart | <b>Artikkeli V:</b> Laitinen, P., Riihimäki, I., Räisänen, J., & Collaboration, I. (2003). Arsenic diffusion in relaxed SiGe. <i>Physical Review B, 68, 155209.</i> DOI: <a href="https://doi.org/10.1103/PhysRevB.68.155209"target="_blank"> 10.1103/PhysRevB.68.155209</a> | |
dc.relation.isversionof | ISBN 951-39-1698-7 | |
dc.rights | In Copyright | |
dc.title | Self- and impurity diffusion in intrinsic relaxed silicon-germanium | |
dc.type | Diss. | |
dc.identifier.urn | URN:ISBN:978-951-39-3150-6 | |
dc.type.dcmitype | Text | en |
dc.type.ontasot | Väitöskirja | fi |
dc.type.ontasot | Doctoral dissertation | en |
dc.contributor.tiedekunta | Matemaattis-luonnontieteellinen tiedekunta | fi |
dc.contributor.tiedekunta | Faculty of Mathematics and Science | en |
dc.contributor.yliopisto | University of Jyväskylä | en |
dc.contributor.yliopisto | Jyväskylän yliopisto | fi |
dc.contributor.oppiaine | Fysiikka | fi |
dc.relation.issn | 0075-465X | |
dc.relation.numberinseries | no. 1/2004 | |
dc.rights.accesslevel | openAccess | |
dc.rights.url | https://rightsstatements.org/page/InC/1.0/ | |