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dc.contributor.authorNapari, Mari
dc.contributor.authorTarvainen, Olli
dc.contributor.authorKinnunen, Sami
dc.contributor.authorArstila, Kai
dc.contributor.authorJulin, Jaakko
dc.contributor.authorFjellvåg, Ø. S.
dc.contributor.authorWeibye, K.
dc.contributor.authorNilsen, O.
dc.contributor.authorSajavaara, Timo
dc.date.accessioned2017-03-16T07:46:47Z
dc.date.available2018-02-06T22:45:10Z
dc.date.issued2017
dc.identifier.citationNapari, M., Tarvainen, O., Kinnunen, S., Arstila, K., Julin, J., Fjellvåg, Ø. S., Weibye, K., Nilsen, O., & Sajavaara, T. (2017). The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges. <i>Journal of Physics D: Applied Physics</i>, <i>50</i>(9), Article 095201. <a href="https://doi.org/10.1088/1361-6463/aa59b3" target="_blank">https://doi.org/10.1088/1361-6463/aa59b3</a>
dc.identifier.otherCONVID_26885605
dc.identifier.otherTUTKAID_73138
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/53283
dc.description.abstractTwo distinguishable plasma modes in the O2–N2 radio frequency capacitively coupled plasma (CCP) used in remote plasma-enhanced atomic layer deposition (PEALD) were observed. Optical emission spectroscopy and spectra interpretation with rate coecient analysis of the relevant processes were used to connect the detected modes to the a and g modes of the CCP discharge. To investigate the e↵ect of the plasma modes on the PEALD film growth, ZnO and TiO2 films were deposited using both modes and compared to the films deposited using direct plasma. The growth rate, thickness uniformity, elemental composition, and crystallinity of the films were found to correlate with the deposition mode. In remote CCP operations the transition to the g mode can result in a parasitic discharge leading to uncontrollable film growth and thus limit the operation parameters of the capacitive discharge in the PEALD applications.
dc.language.isoeng
dc.publisherIOP Publishing
dc.relation.ispartofseriesJournal of Physics D: Applied Physics
dc.subject.otherplasma-enhanced atomic layer deposition
dc.subject.otherplasma modes
dc.titleThe α and γ plasma modes in plasma-enhanced atomic layer deposition with O2–N2 capacitive discharges
dc.typearticle
dc.identifier.urnURN:NBN:fi:jyu-201703131628
dc.contributor.laitosFysiikan laitosfi
dc.contributor.laitosDepartment of Physicsen
dc.contributor.oppiaineKiihdytinlaboratoriofi
dc.contributor.oppiaineAccelerator Laboratoryen
dc.type.urihttp://purl.org/eprint/type/JournalArticle
dc.date.updated2017-03-13T10:15:08Z
dc.type.coarhttp://purl.org/coar/resource_type/c_2df8fbb1
dc.description.reviewstatuspeerReviewed
dc.relation.issn0022-3727
dc.relation.numberinseries9
dc.relation.volume50
dc.type.versionacceptedVersion
dc.rights.copyright© 2017 IOP Publishing Ltd. This is a final draft version of an article whose final and definitive form has been published by IOP. Published in this repository with the kind permission of the publisher.
dc.rights.accesslevelopenAccessfi
dc.relation.doi10.1088/1361-6463/aa59b3
dc.type.okmA1


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