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dc.contributor.authorKilpi, Laura
dc.contributor.authorYlivaara, Oili M. E.
dc.contributor.authorVaajoki, Antti
dc.contributor.authorLiu, Xuwen
dc.contributor.authorRontu, Ville
dc.contributor.authorSintonen, Sakari
dc.contributor.authorHaimi, Eero
dc.contributor.authorMalm, Jari
dc.contributor.authorBosund, Markus
dc.contributor.authorTuominen, Marko
dc.contributor.authorSajavaara, Timo
dc.contributor.authorLipsanen, Harri
dc.contributor.authorHannula, Simo-Pekka
dc.contributor.authorPuurunen, Riikka L.
dc.contributor.authorRonkainen, Helena
dc.date.accessioned2018-01-17T08:14:01Z
dc.date.available2018-12-02T22:35:39Z
dc.date.issued2018
dc.identifier.citationKilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., . . . Ronkainen, H. (2018). Tribological properties of thin films made by atomic layer deposition sliding against silicon. <em>Journal of Vacuum Science and Technology A </em>, 36 (1), 01A122. <a href="https://doi.org/10.1116/1.5003729">doi:10.1116/1.5003729</a>
dc.identifier.otherTUTKAID_76551
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/56760
dc.description.abstractInterfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALD coatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications
dc.language.isoeng
dc.publisherAIP Publishing LLC
dc.relation.ispartofseriesJournal of Vacuum Science and Technology A
dc.subject.otherohutkalvot
dc.subject.othertribologia
dc.subject.otheratomikerroskasvatus
dc.subject.otheratomit
dc.subject.otherkitka
dc.subject.othernanomateriaalit
dc.subject.otherthin films
dc.subject.othertribology
dc.subject.otheratomic layer deposition
dc.subject.otheratoms
dc.subject.otherfriction
dc.subject.othernanomaterials
dc.titleTribological properties of thin films made by atomic layer deposition sliding against silicon
dc.typearticle
dc.identifier.urnURN:NBN:fi:jyu-201801161214
dc.contributor.laitosFysiikan laitosfi
dc.contributor.laitosDepartment of Physicsen
dc.contributor.oppiaineFysiikka
dc.type.urihttp://purl.org/eprint/type/JournalArticle
dc.date.updated2018-01-16T13:15:15Z
dc.type.coarjournal article
dc.description.reviewstatuspeerReviewed
dc.relation.issn0734-2101
dc.relation.volume36
dc.type.versionpublishedVersion
dc.rights.copyright© Published by the AVS. Published in this repository with the kind permission of the publisher.
dc.rights.accesslevelopenAccessfi
dc.relation.doi10.1116/1.5003729


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