Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides
Seemen, H., Rähn, M., Kalam, K., Sajavaara, T., Dueñas, S., Castán, H., Link, J., Stern, R., Kukli, K., & Tamm, A. (2018). Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides. ECS Journal of Solid State Science and Technology, 7(8), P402-P409. https://doi.org/10.1149/2.0191808jss
Julkaistu sarjassa
ECS Journal of Solid State Science and TechnologyTekijät
Päivämäärä
2018Tekijänoikeudet
© The Author(s) 2018.
Five-layer crystalline thin film structures were formed, consisting of ZrO2 and Co3O4 alternately grown on Si(100) substrates
by atomic layer deposition at 300◦C using ZrCl4 and Co(acac)3 as the metal precursors and ozone as the oxygen precursor. The
performance of the laminate films was dependent on the relative content of constituent oxide layers. The magnetization in these
films was nonlinear, saturative, and with very weak coercive fields. Electrical measurements revealed the formation of significant
polarization versus external field loops and implied some tendency toward memristive behavior.
Julkaisija
Electrochemical SocietyISSN Hae Julkaisufoorumista
2162-8769Julkaisu tutkimustietojärjestelmässä
https://converis.jyu.fi/converis/portal/detail/Publication/28197352
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