Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides
Abstract
Five-layer crystalline thin film structures were formed, consisting of ZrO2 and Co3O4 alternately grown on Si(100) substrates
by atomic layer deposition at 300◦C using ZrCl4 and Co(acac)3 as the metal precursors and ozone as the oxygen precursor. The
performance of the laminate films was dependent on the relative content of constituent oxide layers. The magnetization in these
films was nonlinear, saturative, and with very weak coercive fields. Electrical measurements revealed the formation of significant
polarization versus external field loops and implied some tendency toward memristive behavior.
Main Authors
Format
Articles
Research article
Published
2018
Series
Subjects
Publication in research information system
Publisher
Electrochemical Society
The permanent address of the publication
https://urn.fi/URN:NBN:fi:jyu-201807303652Use this for linking
Review status
Peer reviewed
ISSN
2162-8769
DOI
https://doi.org/10.1149/2.0191808jss
Language
English
Published in
ECS Journal of Solid State Science and Technology
Citation
- Seemen, H., Rähn, M., Kalam, K., Sajavaara, T., Dueñas, S., Castán, H., Link, J., Stern, R., Kukli, K., & Tamm, A. (2018). Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides. ECS Journal of Solid State Science and Technology, 7(8), P402-P409. https://doi.org/10.1149/2.0191808jss
License
Copyright© The Author(s) 2018.