| dc.contributor.author | Gorelick, Sergey | |
| dc.contributor.author | Ylimäki, Tommi | |
| dc.contributor.author | Sajavaara, Timo | |
| dc.contributor.author | Laitinen, Mikko | |
| dc.contributor.author | Whitlow, Harry | |
| dc.date.accessioned | 2017-06-30T06:20:44Z | |
| dc.date.available | 2017-06-30T06:20:44Z | |
| dc.date.issued | 2007 | |
| dc.identifier.citation | Gorelick, S., Ylimäki, T., Sajavaara, T., Laitinen, M., & Whitlow, H. (2007). Development of a MeV ion beam lithography system in Jyväskylä. <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i>, <i>260</i>(1), 77-80. <a href="https://doi.org/10.1016/j.nimb.2007.01.260" target="_blank">https://doi.org/10.1016/j.nimb.2007.01.260</a> | |
| dc.identifier.other | CONVID_17714408 | |
| dc.identifier.uri | https://jyx.jyu.fi/handle/123456789/54764 | |
| dc.description.abstract | A lithographic facility for writing patterns with ion beams from cyclotron beams is under development for the Jyväskylä cyclotron. Instead of focusing and deflecting the beam with electrostatic and magnetic fields a different approach is used. Here a small rectangular beam spot is defined by the shadow of a computer-controlled variable aperture in close proximity to the sample. This allows parallel exposure of rectangular pattern elements of 5–500 μm side with protons up to 6 MeV and heavy ions (20Ne, 85Kr) up to few 100 MeV. Here we present a short overview of the system under construction and development of the aperture design, which is a critical aspect for all ion beam lithography systems. | |
| dc.language.iso | eng | |
| dc.publisher | Elsevier BV | |
| dc.relation.ispartofseries | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | |
| dc.subject.other | MeV ion beam lithography | |
| dc.subject.other | cyclotron | |
| dc.subject.other | proximity aperture | |
| dc.subject.other | proton beam writing | |
| dc.title | Development of a MeV ion beam lithography system in Jyväskylä | |
| dc.type | research article | |
| dc.identifier.urn | URN:NBN:fi:jyu-201706283147 | |
| dc.contributor.laitos | Fysiikan laitos | fi |
| dc.contributor.laitos | Department of Physics | en |
| dc.type.uri | http://purl.org/eprint/type/JournalArticle | |
| dc.date.updated | 2017-06-28T03:18:31Z | |
| dc.type.coar | http://purl.org/coar/resource_type/c_2df8fbb1 | |
| dc.description.reviewstatus | peerReviewed | |
| dc.format.pagerange | 77-80 | |
| dc.relation.issn | 0168-583X | |
| dc.relation.numberinseries | 1 | |
| dc.relation.volume | 260 | |
| dc.type.version | acceptedVersion | |
| dc.rights.copyright | © 2007 Elsevier B.V. This is a final draft version of an article whose final and definitive form has been published by Elsevier. Published in this repository with the kind permission of the publisher. | |
| dc.rights.accesslevel | openAccess | fi |
| dc.type.publication | article | |
| dc.relation.doi | 10.1016/j.nimb.2007.01.260 | |
| dc.type.okm | A1 | |
