dc.contributor.author | Kilpi, Lauri | |
dc.contributor.author | Ylivaara, Oili M. E. | |
dc.contributor.author | Vaajoki, Antti | |
dc.contributor.author | Malm, Jari | |
dc.contributor.author | Sintonen, Sakari | |
dc.contributor.author | Tuominen, Marko | |
dc.contributor.author | Puurunen, Riikka L. | |
dc.contributor.author | Ronkainen, Helena | |
dc.date.accessioned | 2016-06-09T10:26:28Z | |
dc.date.available | 2016-11-20T22:45:06Z | |
dc.date.issued | 2016 | |
dc.identifier.citation | Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L., & Ronkainen, H. (2016). Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon. <i>Journal of Vacuum Science and Technology A</i>, <i>34</i>(1), Article 01A124. <a href="https://doi.org/10.1116/1.4935959" target="_blank">https://doi.org/10.1116/1.4935959</a> | |
dc.identifier.other | CONVID_25351155 | |
dc.identifier.other | TUTKAID_68096 | |
dc.identifier.uri | https://jyx.jyu.fi/handle/123456789/50232 | |
dc.description.abstract | The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual
critical load criteria designed for scratch testing of coatings were not applicable to thin atomic
layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were
established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers
were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points
of the silicon substrate and the coating delamination points of the ALD coating. The adhesion
performance of the ALD Al2O3, TiO2, TiN, and TaCNþRu coatings with a thickness range
between 20 and 600 nm and deposition temperature between 30 and 410 C on silicon wafers was
investigated. In addition, the impact of the annealing process after deposition on adhesion was
evaluated for selected cases. The tests carried out using scratch and Scotch tape test showed that
the coating deposition and annealing temperature, thickness of the coating, and surface
pretreatments of the Si wafer had an impact on the adhesion performance of the ALD coatings on
the silicon wafer. There was also an improved load carrying capacity due to Al2O3, the magnitude
of which depended on the coating thickness and the deposition temperature. The tape tests were
carried out for selected coatings as a comparison. The results show that the scratch test is a useful
and applicable tool for adhesion evaluation of ALD coatings, even when carried out for thin (20 nm
thick) coatings. | |
dc.language.iso | eng | |
dc.publisher | American Institute of Physics | |
dc.relation.ispartofseries | Journal of Vacuum Science and Technology A | |
dc.subject.other | scratch test | |
dc.title | Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon | |
dc.type | article | |
dc.identifier.urn | URN:NBN:fi:jyu-201606092993 | |
dc.contributor.laitos | Fysiikan laitos | fi |
dc.contributor.laitos | Department of Physics | en |
dc.type.uri | http://purl.org/eprint/type/JournalArticle | |
dc.date.updated | 2016-06-09T09:15:29Z | |
dc.type.coar | http://purl.org/coar/resource_type/c_2df8fbb1 | |
dc.description.reviewstatus | peerReviewed | |
dc.relation.issn | 0734-2101 | |
dc.relation.numberinseries | 1 | |
dc.relation.volume | 34 | |
dc.type.version | publishedVersion | |
dc.rights.copyright | © 2015 American Vacuum Society. Published by AIP. Published in this repository with the kind permission of the publisher. | |
dc.rights.accesslevel | openAccess | fi |
dc.subject.yso | ohutkalvot | |
dc.subject.yso | atomikerroskasvatus | |
dc.subject.yso | adheesio | |
dc.subject.yso | pii | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p16644 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p27468 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p6154 | |
jyx.subject.uri | http://www.yso.fi/onto/yso/p15609 | |
dc.relation.doi | 10.1116/1.4935959 | |
dc.type.okm | A1 | |