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Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor

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Torgovkin, A., Chaudhuri, S., Malm, J., Sajavaara, T., & Maasilta, I. (2015). Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor. IEEE Transactions on Applied Superconductivity, 25(3), Article 1101604. https://doi.org/10.1109/TASC.2014.2383914
Published in
IEEE Transactions on Applied Superconductivity
Authors
Torgovkin, Andrii |
Chaudhuri, Saumyadip |
Malm, Jari |
Sajavaara, Timo |
Maasilta, Ilari
Date
2015
Discipline
FysiikkaNanoscience CenterKiihdytinlaboratorioPhysicsNanoscience CenterAccelerator Laboratory
Copyright
© 2014 IEEE. Personal use is permitted, but republication/redistribution requires IEEE permission. Published in this repository with the kind permission of the publisher.

 
Publisher
Institute of Electrical and Electronics Engineers
ISSN Search the Publication Forum
1051-8223
Keywords
pseudogap thermometry thin film tunnel junctions atomikerroskasvatus suprajohtavuus
DOI
https://doi.org/10.1109/TASC.2014.2383914
URI

http://urn.fi/URN:NBN:fi:jyu-201504301695

Publication in research information system

https://converis.jyu.fi/converis/portal/detail/Publication/24680709

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