Superconducting tantalum nitride-based normal metal-insulator-superconductor tunnel junctions
Abstract
We report the development of superconducting tantalum nitride (TaN
x
) normal
metal-insulator-superconductor (NIS) tunnel junctions. For the insulating barrier, we used both
AlO
x
and TaO
x
(Cu-AlO
x
-Al-TaN
x
and Cu-TaO
x
-TaN
x
), with both devices exhibiting temperature
dependent current-voltage characteristics which follow the simple one-particle tunneling model.
The superconducting gap follows a BCS type temperature dependence, rendering these devices
suitable for sensitive thermometry and bolometry from the superconducting transition temperature
T
C
of the TaN
x
film at
5 K down to
0.5 K. Numerical simulations were also performed to
predict how junction parameters should be tuned to achieve electronic cooling at temperatures
above 1 K.
V
C
2014 AIP Publishing LLC
.
Main Authors
Format
Articles
Research article
Published
2014
Series
Subjects
Publication in research information system
Publisher
American Institute of Physics
Original source
http://scitation.aip.org/content/aip/journal/apl/104/12/10.1063/1.4869563
The permanent address of the publication
https://urn.fi/URN:NBN:fi:jyu-201408282682Use this for linking
Review status
Peer reviewed
ISSN
0003-6951
DOI
https://doi.org/10.1063/1.4869563
Language
English
Published in
Applied Physics Letters
Citation
- Chaudhuri, S., & Maasilta, I. (2014). Superconducting tantalum nitride-based normal metal-insulator-superconductor tunnel junctions. Applied Physics Letters, 104(12), Article 122601. https://doi.org/10.1063/1.4869563
Copyright© 2014 AIP Publishing LLC. This is an article whose final and definitive form has been published by AIP Publishing LLC.