Superconducting tantalum nitride-based normal metal-insulator-superconductor tunnel junctions

Abstract
We report the development of superconducting tantalum nitride (TaN x ) normal metal-insulator-superconductor (NIS) tunnel junctions. For the insulating barrier, we used both AlO x and TaO x (Cu-AlO x -Al-TaN x and Cu-TaO x -TaN x ), with both devices exhibiting temperature dependent current-voltage characteristics which follow the simple one-particle tunneling model. The superconducting gap follows a BCS type temperature dependence, rendering these devices suitable for sensitive thermometry and bolometry from the superconducting transition temperature T C of the TaN x film at 5 K down to 0.5 K. Numerical simulations were also performed to predict how junction parameters should be tuned to achieve electronic cooling at temperatures above 1 K. V C 2014 AIP Publishing LLC .
Main Authors
Format
Articles Research article
Published
2014
Series
Subjects
Publication in research information system
Publisher
American Institute of Physics
Original source
http://scitation.aip.org/content/aip/journal/apl/104/12/10.1063/1.4869563
The permanent address of the publication
https://urn.fi/URN:NBN:fi:jyu-201408282682Use this for linking
Review status
Peer reviewed
ISSN
0003-6951
DOI
https://doi.org/10.1063/1.4869563
Language
English
Published in
Applied Physics Letters
Citation
  • Chaudhuri, S., & Maasilta, I. (2014). Superconducting tantalum nitride-based normal metal-insulator-superconductor tunnel junctions. Applied Physics Letters, 104(12), Article 122601. https://doi.org/10.1063/1.4869563
License
CC BY 3.0Open Access
Copyright© 2014 AIP Publishing LLC. This is an article whose final and definitive form has been published by AIP Publishing LLC.

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