Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films : a DFT study
Mäkinen, M., Weckman, T., & Laasonen, K. (2024). Modelling the growth reaction pathways of zincone ALD/MLD hybrid thin films : a DFT study. Physical Chemistry Chemical Physics, 26(24), 17334-17344. https://doi.org/10.1039/d4cp00249k
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Physical Chemistry Chemical PhysicsDate
2024Copyright
© the Owner Societies 2024
ALD/MLD hybrid thin films can be fabricated by combining atomic layer deposition (ALD) and molecular layer deposition (MLD). Even though this deposition method has been extensively used experimentally, the computational work required to acquire the reaction paths during the thin film deposition process is still in dire demand. We investigated hybrid thin films consisting of diethyl zinc and either 4-aminophenol or hydroquinone using both gas-phase and surface reactions to gain extensive knowledge of the complex phenomena occurring during the process of hybrid thin film deposition. We used density functional theory (DFT) to obtain the activation energies of these kinetic-dependent deposition processes. Different processes of ethyl ligand removal as ethane were discovered, and we found that the hydroxyl group of 4-aminophenol was more reactive than the amino group in the migration of hydrogen to an ethyl ligand within a complicated branching reaction chain.
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Royal Society of ChemistryISSN Search the Publication Forum
1463-9076Keywords
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https://converis.jyu.fi/converis/portal/detail/Publication/220836210
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Jane and Aatos Erkko FoundationFunding program(s)
FoundationAdditional information about funding
This work was supported by the Finnish Cultural Foundation. The authors wish to acknowledge the CSC - IT Center for Science, Finland, for the computational resources. Timo Weckman acknowledges Jane and Aatos Erkko Foundation for the funding for the LACOR project.License
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