Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation
Mentel, K. K., Emelianov, A. V., Philip, A., Johansson, A., Karppinen, M., & Pettersson, M. (2022). Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation. Advanced Materials Interfaces, 9(29), Article 2201110. https://doi.org/10.1002/admi.202201110
Published in
Advanced Materials InterfacesAuthors
Date
2022Copyright
© 2022 The Authors. Advanced Materials Interfaces published by Wiley-VCH GmbH.
Area-selective atomic layer deposition (ALD) is a promising “bottom-up” alternative to current nanopatterning techniques. While it has been successfully implemented in traditional microelectronic processes, selective nucleation of ALD on 2D materials has so far remained an unsolved challenge. In this article, a precise control of the selective deposition of ZnO on graphene at low temperatures (<250 °C) is demonstrated. Maskless femtosecond laser writing is used to locally activate predefined surface areas (down to 300 nm) by functionalizing graphene to achieve excellent ALD selectivity (up to 100%) in these regions for 6-nm-thick ZnO films. The intrinsic conductive properties of graphene can be restored by thermal annealing at low temperature (300 °C) without destroying the deposited ZnO patterns. As the graphene layer can be transferred onto other material surfaces, the present patterning technique opens new attractive ways for various applications in which the functionalized graphene is utilized as a template layer for selective deposition of desired materials.
...
Publisher
WileyISSN Search the Publication Forum
2196-7350Keywords
Publication in research information system
https://converis.jyu.fi/converis/portal/detail/Publication/155941654
Metadata
Show full item recordCollections
Related funder(s)
Research Council of Finland; Jane and Aatos Erkko FoundationFunding program(s)
Academy Project, AoF; FoundationAdditional information about funding
The authors acknowledge fundings from the Academy of Finland (Flagship PREIN and grant no. 311330), and from the Jane and Aatos Erkko Foundation.License
Related items
Showing items with similar title or keywords.
-
Preparation of graphene nanocomposites from aqueous silver nitrate using graphene oxide’s peroxidase-like and carbocatalytic properties
Garg, Kunal; Papponen, Petri; Johansson, Andreas; Puttaraksa, Nitipon; Gilbert, Leona (Nature Publishing Group, 2020)The present study evaluates the role of graphene oxide’s (GO’s) peroxidase-like and inherent/carbocatalytic properties in oxidising silver nitrate (AgNO3) to create graphene nanocomposites with silver nanoparticles (GO/Ag ... -
Paraffin assisted graphene transfer
Thakur, Abhishek (2023)In this master’s thesis, we propose Paraffin support layer as an alternative to the well established and widely used PMMA for CVD grown Graphene transfer process. The motivation behind the project being to eliminate the ... -
Optically Forged Diffraction-Unlimited Ripples in Graphene
Koskinen, Pekka; Karppinen, Karoliina; Myllyperkiö, Pasi; Hiltunen, Vesa-Matti; Johansson, Andreas; Pettersson, Mika (American Chemical Society, 2018)In nanofabrication, just as in any other craft, the scale of spatial details is limited by the dimensions of the tool at hand. For example, the smallest details of direct laser writing with far-field light are set by the ... -
Experimental studies on carbon nanotubes and graphene functionalized via physical adsorption with cellulose and avidin
Shao, Dongkai (University of Jyväskylä, 2018)In this Thesis I have experimentally studied structural, electronic, and optical properties of hybrids of nanocarbon materials, carbon nanotubes (CNT) and graphene, and certain biomacromolecules. The latter are especially ... -
Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides
Seemen, Helina; Rähn, Mihkel; Kalam, Kristjan; Sajavaara, Timo; Dueñas, Salvador; Castán, Helena; Link, Joosep; Stern, Raivo; Kukli, Kaupo; Tamm, Aile (Electrochemical Society, 2018)Five-layer crystalline thin film structures were formed, consisting of ZrO2 and Co3O4 alternately grown on Si(100) substrates by atomic layer deposition at 300◦C using ZrCl4 and Co(acac)3 as the metal precursors and ozone ...