Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors
Kinnunen, S., Arstila, K., & Sajavaara, T. (2021). Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors. Applied Surface Science, 546, Article 148909. https://doi.org/10.1016/j.apsusc.2020.148909
Julkaistu sarjassa
Applied Surface SciencePäivämäärä
2021Oppiaine
Ydin- ja kiihdytinfysiikan huippuyksikköFysiikkaCentre of Excellence in Nuclear and Accelerator Based PhysicsPhysicsTekijänoikeudet
© 2020 Elsevier
In this work hydrogen and oxygen migration and exchange reactions in the atomic layer deposited (ALD) Al2O3 thin films were studied together with hydrogen incorporation by varying deposition parameters. Al2O3 films deposited at low temperatures can contain more than 20 at. % of hydrogen. Both higher temperature and longer purge length decrease the hydrogen and carbon concentrations significantly. In order to track the hydrogen and oxygen movement in the films, heavy water (2H216O) and oxygen-18 enriched water (1H218O) were used as precursors in combination with trimethylaluminium (TMA). Different isotopes of the same element were quantified by means of time-of-flight elastic recoil detection analysis (ToF-ERDA). It was found out that 1H/2H exchange reactions take place even at room temperature if the hydrogen concentration is high enough. On the other hand, oxygen atoms in the films do not migrate notably.
Julkaisija
ElsevierISSN Hae Julkaisufoorumista
0169-4332Asiasanat
Julkaisu tutkimustietojärjestelmässä
https://converis.jyu.fi/converis/portal/detail/Publication/47869352
Metadata
Näytä kaikki kuvailutiedotKokoelmat
Lisenssi
Samankaltainen aineisto
Näytetään aineistoja, joilla on samankaltainen nimeke tai asiasanat.
-
Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors
Yang, Jun; Bahrami, Amin; Ding, Xingwei; Zhao, Panpan; He, Shiyang; Lehmann, Sebastian; Laitinen, Mikko; Julin, Jaakko; Kivekäs, Mikko; Sajavaara, Timo; Nielsch, Kornelius (Wiley-VCH Verlag, 2022)SbOx thin films are deposited by atomic layer deposition (ALD) using SbCl5 and Sb(NMe2)3 as antimony reactants and H2O and H2O2 as oxidizers at low temperatures. SbCl5 can react with both oxidizers, while no deposition is ... -
In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres
Broas, Mikael; Lemettinen, Jori; Sajavaara, Timo; Tilli, Markku; Vuorinen, Vesa; Suihkonen, Sami; Paulasto-Kröckel, Mervi (Elsevier BV, 2019)Atomic-layer-deposited Al2O3 films can be used for passivation, protective, and functional purposes in electronic devices. However, as-deposited, amorphous alumina is susceptible to chemical attack and corrosion during ... -
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
Ylivaara, Oili M. E.; Langner, Andreas; Ek, Satu; Malm, Jari; Julin, Jaakko; Laitinen, Mikko; Ali, Saima; Sintonen, Sakari; Lipsanen, Harri; Sajavaara, Timo; Puurunen, Riikka L. (American Vacuum Society, 2022)In microelectromechanical system devices, thin films experience thermal processing at temperatures some cases exceeding the growth or deposition temperature of the film. In the case of the thin film grown by atomic layer ... -
Spatial ALD of Al2O3 and ZnO using heavy water
Kinnunen, Sami; Sajavaara, Timo (Elsevier, 2022)Al2O3 and ZnO thin films were deposited from trimethylaluminium (TMA) and diethylzinc (DEZ) in combination with water using cylindrical rotating substrate spatial atomic layer deposition (SALD). The depositions were done ... -
Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor
Mattelaer, Felix; Van Daele, Michiel; Minjauw, Matthias M.; Nisula, Mikko; Elliott, Simon D.; Sajavaara, Timo; Dendooven, Jolien; Detavernier, Christophe (American Chemical Society, 2020)Atomic layer deposition (ALD) of boron-containing films has been mainly studied for use in 2D materials and for B-doping of Si. Furthermore, lithium-containing borates show great promise as solid electrolyte coatings for ...
Ellei toisin mainittu, julkisesti saatavilla olevia JYX-metatietoja (poislukien tiivistelmät) saa vapaasti uudelleenkäyttää CC0-lisenssillä.