Development of MeV ion beam lithography technique for microfluidic applications

dc.contributor.author	Puttaraksa, Nitipon
dc.date.accessioned	2011-10-21T08:10:04Z
dc.date.available	2011-10-21T08:10:04Z
dc.date.issued	2011
dc.identifier.isbn	978-951-39-4267-0
dc.identifier.other	oai:jykdok.linneanet.fi:1185836
dc.identifier.uri	https://jyx.jyu.fi/handle/123456789/36839
dc.format.extent	verkkoaineisto (136 sivua).
dc.language.iso	eng
dc.publisher	University of Jyväskylä
dc.relation.ispartofseries	Research report / Department of Physics, University of Jyväskylä
dc.relation.isversionof	ISBN 978-951-39-4266-3
dc.rights	In Copyright
dc.subject.other	ionisuihkulitografia
dc.title	Development of MeV ion beam lithography technique for microfluidic applications
dc.type	doctoral thesis
dc.identifier.urn	URN:ISBN:978-951-39-4267-0
dc.type.dcmitype	Text	en
dc.type.ontasot	Väitöskirja	fi
dc.type.ontasot	Doctoral dissertation	en
dc.contributor.tiedekunta	Matemaattis-luonnontieteellinen tiedekunta	fi
dc.contributor.tiedekunta	Faculty of Mathematics and Science	en
dc.contributor.yliopisto	University of Jyväskylä	en
dc.contributor.yliopisto	Jyväskylän yliopisto	fi
dc.contributor.oppiaine	Fysiikka	fi
dc.type.coar	http://purl.org/coar/resource_type/c_db06
dc.relation.issn	0075-465X
dc.relation.numberinseries	no. 3/2011
dc.rights.accesslevel	openAccess
dc.type.publication	doctoralThesis
dc.subject.yso	ionit
dc.rights.url	https://rightsstatements.org/page/InC/1.0/

Except where otherwise noted, this item's license is described as In Copyright

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