MeV ion beam lithography of high aspect ratio structures with a focused or aperture-shaped beam for applications in biomedical studies and microfluidics
Julkaistu sarjassa
Research report / Department of Physics, University of JyväskyläTekijät
Päivämäärä
2008Oppiaine
FysiikkaJulkaisija
University of JyväskyläISBN
978-951-39-3318-0ISSN Hae Julkaisufoorumista
0075-465XAsiasanat
Metadata
Näytä kaikki kuvailutiedotKokoelmat
- Väitöskirjat [3486]
Lisenssi
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Development of MeV ion beam lithography technique for microfluidic applications
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