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dc.contributor.authorKousar, Ayesha
dc.contributor.authorQuliyeva, Ulviyya
dc.contributor.authorPande, Ishan
dc.contributor.authorSainio, Jani
dc.contributor.authorJulin, Jaakko
dc.contributor.authorSajavaara, Timo
dc.contributor.authorJiang, Hua
dc.contributor.authorLaurila, Tomi
dc.date.accessioned2024-02-26T12:47:47Z
dc.date.available2024-02-26T12:47:47Z
dc.date.issued2024
dc.identifier.citationKousar, A., Quliyeva, U., Pande, I., Sainio, J., Julin, J., Sajavaara, T., Jiang, H., & Laurila, T. (2024). Ni Drastically Modifies the Microstructure and Electrochemistry of Thin Ti and Cr Layers. <i>Journal of Physical Chemistry C</i>, <i>128</i>(3), 1457-1468. <a href="https://doi.org/10.1021/acs.jpcc.3c07221" target="_blank">https://doi.org/10.1021/acs.jpcc.3c07221</a>
dc.identifier.otherCONVID_202017401
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/93672
dc.description.abstractThere is a significant lack of literature addressing changes in the microstructure of different interfacial metal layer combinations employed in fabricating electrochemical sensors based on carbon nanomaterials. This research gap extends to analyzing their influence on the electrochemical performance, which, in turn, impacts the understanding of the properties of materials incorporating these layers. In this study, microstructural variations and electrochemical activity of chromium and titanium adhesion layers, in combination with nickel catalyst layers (designated as TiNi and CrNi), on silicon wafers were analyzed post annealing. Interestingly, during a brief annealing period of 5 min, TiNi developed a surface layer comprising graphitic carbon, alongside the formation of TiO2, TiC, and NiSi, and exhibited electrochemical activity toward both dopamine (DA) and ascorbic acid (AA). Conversely, CrNi annealed for 5 min did not show the presence of such a carbon layer and displayed no discernible electrochemical activity toward the target molecules. Only after an extended annealing time of 20 min, signs of a carbon layer appear on CrNi, displaying a moderate electrochemical activity toward DA and AA. The formation of a carbon layer on CrNi is delayed due to the presence of Ni near the surface, which disrupts the local equilibrium. Consequently, the formation of the Cr2O3 barrier layer is delayed, which in turn permits carbon diffusion into the underlying Cr layer. Conversely, Ni stabilizes the β-Ti form and markedly decreases the solubility of carbon and oxygen within the TiNi system. By providing a comprehensive analysis of microstructural changes and their impact on the surface chemistry and electrochemical responses of commonly used interfacial metal layers, this paper offers invaluable insights in selecting suitable adhesion and catalyst layer combinations for carbon nanomaterial fabrication.en
dc.format.mimetypeapplication/pdf
dc.language.isoeng
dc.publisherAmerican Chemical Society (ACS)
dc.relation.ispartofseriesJournal of Physical Chemistry C
dc.rightsCC BY 4.0
dc.subject.otherannealing (metallurgy)
dc.subject.othercarbon nanomaterials
dc.subject.otherlayers
dc.subject.othernanofibers
dc.subject.otheroxides
dc.titleNi Drastically Modifies the Microstructure and Electrochemistry of Thin Ti and Cr Layers
dc.typearticle
dc.identifier.urnURN:NBN:fi:jyu-202402262138
dc.contributor.laitosFysiikan laitosfi
dc.contributor.laitosDepartment of Physicsen
dc.type.urihttp://purl.org/eprint/type/JournalArticle
dc.type.coarhttp://purl.org/coar/resource_type/c_2df8fbb1
dc.description.reviewstatuspeerReviewed
dc.format.pagerange1457-1468
dc.relation.issn1932-7447
dc.relation.numberinseries3
dc.relation.volume128
dc.type.versionpublishedVersion
dc.rights.copyright© 2024 American Chemical Society
dc.rights.accesslevelopenAccessfi
dc.subject.ysosähkökemia
dc.subject.ysonanomateriaalit
dc.subject.ysopintakemia
dc.subject.ysonikkeli
dc.subject.ysoohutkalvot
dc.subject.ysokromi
dc.subject.ysotitaani
dc.subject.ysomikrorakenteet
dc.format.contentfulltext
jyx.subject.urihttp://www.yso.fi/onto/yso/p8093
jyx.subject.urihttp://www.yso.fi/onto/yso/p22976
jyx.subject.urihttp://www.yso.fi/onto/yso/p15067
jyx.subject.urihttp://www.yso.fi/onto/yso/p19926
jyx.subject.urihttp://www.yso.fi/onto/yso/p16644
jyx.subject.urihttp://www.yso.fi/onto/yso/p20200
jyx.subject.urihttp://www.yso.fi/onto/yso/p18969
jyx.subject.urihttp://www.yso.fi/onto/yso/p24463
dc.rights.urlhttps://creativecommons.org/licenses/by/4.0/
dc.relation.doi10.1021/acs.jpcc.3c07221
dc.type.okmA1


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