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dc.contributor.advisorJohansson, Andreas
dc.contributor.authorThakur, Abhishek
dc.date.accessioned2024-01-19T07:12:37Z
dc.date.available2024-01-19T07:12:37Z
dc.date.issued2023
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/92894
dc.description.abstractIn this master’s thesis, we propose Paraffin support layer as an alternative to the well established and widely used PMMA for CVD grown Graphene transfer process. The motivation behind the project being to eliminate the two key drawbacks of PMMA transferred graphene. First, the leftover PMMA residue after layer removal, which contaminates and reduces the quality of the final film. Second, the cracks and wrinkles observed in the graphene post-transfer. In the works of Leong et. al. and Villa et. al., they demonstrate that paraffin helps mitigate these issues as it is easier to remove, thanks to its alkane properties and low melting point. Furthermore, paraffin also has a higher coefficient of thermal expansion which can be utilized to stretch the graphene during transfer to help get rid of wrinkles and its flexible nature helps keep the graphene intact. In our work, we tried recreating those results by simulating similar transfer parameters to the best of our ability as well as trying some different iterations of our own. Our results show some promise in terms of obtaining cleaner and wrinkle free Graphene, but keeping large areas of the films intact during transfer remains a challenge. Thus, further optimizations at several stages of the transfer process are required.en
dc.format.extent44
dc.language.isoeng
dc.rightsIn Copyright
dc.titleParaffin assisted graphene transfer
dc.identifier.urnURN:NBN:fi:jyu-202401191390
dc.type.ontasotMaster’s thesisen
dc.type.ontasotPro gradu -tutkielmafi
dc.contributor.tiedekuntaFaculty of Sciencesen
dc.contributor.tiedekuntaMatemaattis-luonnontieteellinen tiedekuntafi
dc.contributor.laitosDepartment of Physicsen
dc.contributor.laitosFysiikan laitosfi
dc.contributor.yliopistoUniversity of Jyväskyläen
dc.contributor.yliopistoJyväskylän yliopistofi
dc.contributor.oppiainePhysicsen
dc.contributor.oppiaineFysiikkafi
dc.rights.copyright© The Author(s)
dc.rights.accesslevelopenAccess
dc.contributor.oppiainekoodi4021
dc.subject.ysografeeni
dc.subject.ysokemiallinen kaasufaasipinnoitus
dc.subject.ysospektroskopia
dc.subject.ysoparafiinit
dc.subject.ysorypistyvyys
dc.subject.ysomikroskopia
dc.subject.ysonanotekniikka
dc.subject.ysografeenioksidi
dc.subject.ysonanorakenteet
dc.subject.ysonanomateriaalit
dc.subject.ysographene
dc.subject.ysochemical vapour deposition
dc.subject.ysospectroscopy
dc.subject.ysoparaffins
dc.subject.ysowrinkling
dc.subject.ysomicroscopy
dc.subject.ysonanotechnology
dc.subject.ysographene oxide
dc.subject.ysonanostructures
dc.subject.ysonanomaterials
dc.rights.urlhttps://rightsstatements.org/page/InC/1.0/


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