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dc.contributor.authorTarvainen, Olli
dc.contributor.authorPeng, S. X.
dc.date.accessioned2016-11-18T09:13:06Z
dc.date.available2016-11-18T09:13:06Z
dc.date.issued2016
dc.identifier.citationTarvainen, O., & Peng, S. X. (2016). Radiofrequency and 2.45 GHz electron cyclotron resonance H− volume production ion sources. <i>New Journal of Physics</i>, <i>18</i>(10), Article 105008. <a href="https://doi.org/10.1088/1367-2630/18/10/105008" target="_blank">https://doi.org/10.1088/1367-2630/18/10/105008</a>
dc.identifier.otherCONVID_26316340
dc.identifier.otherTUTKAID_71725
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/51919
dc.description.abstractThe volume production of negative hydrogen ions (H-) in plasma ion sources is based on dissociative electron attachment (DEA)to rovibrationally excited hydrogen molecules(H2), which is a two-step process requiring both, hot electrons for ionization, and vibrational excitation of the H2 and cold electrons for the H- formation through DEA. Traditionally H- ion sources relying on the volume production have been tandem-type arc discharge sources equipped with biased filament cathodes sustaining the plasma by thermionic electron emission and with a magnetic filter separating the main discharge from the H- formation volume. The main motivation to develop ion sources based on radiofrequency (RF) or electron cyclotron resonance (ECR) plasma discharges is to eliminate the apparent limitation of the cathode lifetime. In this paper we summarize the principles of H- volume production dictating the ion source design and highlight the differences between the arc discharge and RF/ECR ion sources from both, physics and technology point-of-view. Furthermore, we introduce the state-of-the-art RF and ECR H- volume production ion sources and review the challenges and future prospects of these yet developing technologies.
dc.language.isoeng
dc.publisherInstitute of Physics Publishing Ltd.; Deutsche Physikalische Gesellschaft
dc.relation.ispartofseriesNew Journal of Physics
dc.subject.otherdissociative electron attachment
dc.subject.otherelectron cyclotron resonance
dc.subject.othernegative ion source
dc.subject.otherradiofrequency plasma discharge
dc.titleRadiofrequency and 2.45 GHz electron cyclotron resonance H− volume production ion sources
dc.typearticle
dc.identifier.urnURN:NBN:fi:jyu-201611174648
dc.contributor.laitosFysiikan laitosfi
dc.contributor.laitosDepartment of Physicsen
dc.contributor.oppiaineKiihdytinlaboratoriofi
dc.contributor.oppiaineAccelerator Laboratoryen
dc.type.urihttp://purl.org/eprint/type/JournalArticle
dc.date.updated2016-11-17T16:15:03Z
dc.type.coarjournal article
dc.description.reviewstatuspeerReviewed
dc.relation.issn1367-2630
dc.relation.numberinseries10
dc.relation.volume18
dc.type.versionpublishedVersion
dc.rights.copyright© 2016 IOP Publishing Ltd and Deutsche Physikalische Gesellschaft. This is an open access article distributed under the terms of a Creative Commons License.
dc.rights.accesslevelopenAccessfi
dc.rights.urlhttps://creativecommons.org/licenses/by/3.0/
dc.relation.doi10.1088/1367-2630/18/10/105008


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© 2016 IOP Publishing Ltd and Deutsche Physikalische Gesellschaft. This is an open access article distributed under the terms of a Creative Commons License.
Except where otherwise noted, this item's license is described as © 2016 IOP Publishing Ltd and Deutsche Physikalische Gesellschaft. This is an open access article distributed under the terms of a Creative Commons License.