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dc.contributor.authorHahto, Sami
dc.date.accessioned2008-03-03T11:16:06Z
dc.date.available2008-03-03T11:16:06Z
dc.date.issued2003
dc.identifier.isbn978-951-39-3142-1
dc.identifier.otheroai:jykdok.linneanet.fi:1053241
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/13893
dc.format.extent129 sivua
dc.language.isoeng
dc.publisherUniversity of Jyväskylä
dc.relation.ispartofseriesResearch report / Department of Physics, University of Jyväskylä
dc.relation.isversionofISBN 951-39-1574-3
dc.titleDevelopment of negative ion sources for accelerator, fusion and semiconductor manufacturing applications
dc.typeDiss.fi
dc.identifier.urnURN:ISBN:978-951-39-3142-1
dc.type.dcmitypeTexten
dc.type.ontasotVäitöskirjafi
dc.type.ontasotDoctoral dissertationen
dc.contributor.tiedekuntaMatemaattis-luonnontieteellinen tiedekuntafi
dc.contributor.tiedekuntaFaculty of Mathematics and Scienceen
dc.contributor.yliopistoUniversity of Jyväskyläen
dc.contributor.yliopistoJyväskylän yliopistofi
dc.contributor.oppiaineFysiikkafi
dc.relation.issn0075-465X
dc.relation.numberinseriesno. 4/2003
dc.rights.accesslevelopenAccessfi


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