Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications

dc.contributor.author	Hahto, Sami
dc.date.accessioned	2008-03-03T11:16:06Z
dc.date.available	2008-03-03T11:16:06Z
dc.date.issued	2003
dc.identifier.isbn	978-951-39-3142-1
dc.identifier.other	oai:jykdok.linneanet.fi:1053241
dc.identifier.uri	https://jyx.jyu.fi/handle/123456789/13893
dc.format.extent	129 sivua
dc.language.iso	eng
dc.publisher	University of Jyväskylä
dc.relation.ispartofseries	Research report / Department of Physics, University of Jyväskylä
dc.relation.isversionof	ISBN 951-39-1574-3
dc.title	Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications
dc.type	Diss.
dc.identifier.urn	URN:ISBN:978-951-39-3142-1
dc.type.dcmitype	Text	en
dc.type.ontasot	Väitöskirja	fi
dc.type.ontasot	Doctoral dissertation	en
dc.contributor.tiedekunta	Matemaattis-luonnontieteellinen tiedekunta	fi
dc.contributor.tiedekunta	Faculty of Mathematics and Science	en
dc.contributor.yliopisto	University of Jyväskylä	en
dc.contributor.yliopisto	Jyväskylän yliopisto	fi
dc.contributor.oppiaine	Fysiikka	fi
dc.relation.issn	0075-465X
dc.relation.numberinseries	no. 4/2003
dc.rights.accesslevel	openAccess	fi

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