Näytä suppeat kuvailutiedot

dc.contributor.advisorJohansson, Andreas
dc.contributor.authorNeuvonen, Santeri
dc.date.accessioned2021-07-05T08:57:38Z
dc.date.available2021-07-05T08:57:38Z
dc.date.issued2021
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/76987
dc.description.abstractGraphene is a sheet of honeycomb bonded carbon, that is only one atom thick. Aside from its remarkable strength, graphene has great conducting and photochemical prop erties. Due to its unique properties, it can be used as viable option for rare metals in circuits and in new type of measuring components. To express these properties at their best, graphene should be single crystal and as clean as possible. In this bachelor thesis, different treatment options for catalytic metal surface for graphene synthesis are studied in chemical vapor deposition growth. Different options to treat the catalytic metal layer were studied, such as changes in gas compositions in annealing process, electropolishing, plasma and UV-light treatment. All the processes effect the oxidation level of the surface. Different catalytic metals can also lead to higher quality graphene. Synthesised graphene can be cleaned from amorphous carbon by treating it with carbon dioxide or changing the carbon precursor for the chemical vapor deposition process. In the experimental part, the effects of higher concentration of hydrogen during synthesis was studied. Higher concentration of hydrogen led to lower nucleation density of graphene, but the catalytic copper surface was damaged in these processes. After synthesis, anneal ing under carbon dioxide flow was studied as a means of cleaning the surface. It was found to reduce amorphous carbon in the product but it increased the manifestation of double layers.en
dc.format.extent42
dc.language.isoen
dc.titleThe role of oxidation treatments before and after CVD synthesis of graphene on copper catalytic surface
dc.identifier.urnURN:NBN:fi:jyu-202107054173
dc.type.ontasotBachelor's thesisen
dc.type.ontasotKandidaatintyöfi
dc.contributor.tiedekuntaMatemaattis-luonnontieteellinen tiedekuntafi
dc.contributor.tiedekuntaFaculty of Sciencesen
dc.contributor.laitosKemian laitosfi
dc.contributor.laitosDepartment of Chemistryen
dc.contributor.yliopistoJyväskylän yliopistofi
dc.contributor.yliopistoUniversity of Jyväskyläen
dc.contributor.oppiaineKemiafi
dc.contributor.oppiaineChemistryen
dc.rights.copyrightJulkaisu on tekijänoikeussäännösten alainen. Teosta voi lukea ja tulostaa henkilökohtaista käyttöä varten. Käyttö kaupallisiin tarkoituksiin on kielletty.fi
dc.rights.copyrightThis publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.en
dc.rights.accesslevelopenAccess
dc.contributor.oppiainekoodi4038
dc.subject.ysografeeni
dc.subject.ysoohutkalvot
dc.subject.ysopintakäsittely
dc.subject.ysohiilidioksidi
dc.subject.ysohapetus
dc.subject.ysonanorakenteet
dc.subject.ysopuhdistus
dc.subject.ysokemiallinen synteesi
dc.subject.ysokupari
dc.subject.ysographene
dc.subject.ysothin films
dc.subject.ysosurface treatment
dc.subject.ysocarbon dioxide
dc.subject.ysooxidation (active)
dc.subject.ysonanostructures
dc.subject.ysocleaning
dc.subject.ysochemical synthesis
dc.subject.ysocopper
dc.rights.accessrights


Aineistoon kuuluvat tiedostot

Thumbnail

Aineisto kuuluu seuraaviin kokoelmiin

Näytä suppeat kuvailutiedot