Characterization and Monte Carlo evaluation of positioning uncertainty of an MAFM
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Date
2019Copyright
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Nanometrin skaalan pituus-mittaukset pohjautuvat jäljitettävyyteen, ja SI-järjestelmän
metriin. Atomivoimamikroskooppeja (AFM) käytetään pintojen mittaukseen alle
nanometrin erottelukyvyllä. Metrologiset AFM:t (MAFM:t) käyttävät interferometrejä
paikan määritykseen, jolloin pinta-mittauksen ovat suoraan jäljitettäviä.
MIKES MAFM jatkokehitettiin EMPIR-aloitteen 3DNano-projektin puitteissa. Tässä
gradussa laitteen suurimmat epävarmuuden lähteet kartoitettiin ja mallinnettiin.
Järjestelmää kuvaava malli kehitettiin Matlab:illa. Järjestelmän mallin avulla laskettiin,
Monte Carlo–menetelmää käyttäen, 3D kordinaatiston epävarmuudet. Joitain
epävarmuuden lähteitä ei mallinnettu, mutta näitä tarkasteltiin silti laadullisesti.
Alustavat tulokset laskettiin ohjelmallisesti tuotetulle 2D hilarakenteelle, 1 × 105
Monte Carlo –iteraatiolla. Lasketut epävarmuudet jäivät nm-suuruusluokkaan. Järjestelmän
mallin kehitys tulee jatkumaan, jolloin tavoitteeksi tulee mittasuureen
epävarmuuden laskeminen, esim. hilan jaksolle tai askelkorkeudelle.
...
Traceability to the SI metre is the basis for dimensional measurements in the nanometer
scale. Atom Force Microscopes (AFMs) are used to measure surface features
with subnanometre resolution. Metrological AFMs (MAFMs) use interferometers for
positioning, making surface measurements directly traceable. The MIKES MAFM
was further developed under the EMPIR initiative’s 3DNano project. The device’s
largest uncertainty sources were characterized and modeled as part of this thesis,
and used to construct a system model in Matlab. Evaluating the system model using
a simple Monte Carlo method gives us the standard uncertainty components for 3D
positioning. Some uncertainty sources, such as interferometer target mirror flatness,
were qualitatively analyzed but not modeled. Preliminary results were generated
using surface points of computer-generated 2D lattice, and 1 × 105 Monte Carlo
trials. The computed uncertainties were all in the nm range. Development of the
model will continue, with the goal of evaluating uncertainty for a measurand such as
grating pitch or step height.
...




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