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Characterization and Monte Carlo evaluation of positioning uncertainty of an MAFM

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Authors
Nysten, Johan
Date
2019
Discipline
Soveltava fysiikkaApplied Physics
Copyright
This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.

 
Nanometrin skaalan pituus-mittaukset pohjautuvat jäljitettävyyteen, ja SI-järjestelmän metriin. Atomivoimamikroskooppeja (AFM) käytetään pintojen mittaukseen alle nanometrin erottelukyvyllä. Metrologiset AFM:t (MAFM:t) käyttävät interferometrejä paikan määritykseen, jolloin pinta-mittauksen ovat suoraan jäljitettäviä. MIKES MAFM jatkokehitettiin EMPIR-aloitteen 3DNano-projektin puitteissa. Tässä gradussa laitteen suurimmat epävarmuuden lähteet kartoitettiin ja mallinnettiin. Järjestelmää kuvaava malli kehitettiin Matlab:illa. Järjestelmän mallin avulla laskettiin, Monte Carlo–menetelmää käyttäen, 3D kordinaatiston epävarmuudet. Joitain epävarmuuden lähteitä ei mallinnettu, mutta näitä tarkasteltiin silti laadullisesti. Alustavat tulokset laskettiin ohjelmallisesti tuotetulle 2D hilarakenteelle, 1 × 105 Monte Carlo –iteraatiolla. Lasketut epävarmuudet jäivät nm-suuruusluokkaan. Järjestelmän mallin kehitys tulee jatkumaan, jolloin tavoitteeksi tulee mittasuureen epävarmuuden laskeminen, esim. hilan jaksolle tai askelkorkeudelle. ...
 
Traceability to the SI metre is the basis for dimensional measurements in the nanometer scale. Atom Force Microscopes (AFMs) are used to measure surface features with subnanometre resolution. Metrological AFMs (MAFMs) use interferometers for positioning, making surface measurements directly traceable. The MIKES MAFM was further developed under the EMPIR initiative’s 3DNano project. The device’s largest uncertainty sources were characterized and modeled as part of this thesis, and used to construct a system model in Matlab. Evaluating the system model using a simple Monte Carlo method gives us the standard uncertainty components for 3D positioning. Some uncertainty sources, such as interferometer target mirror flatness, were qualitatively analyzed but not modeled. Preliminary results were generated using surface points of computer-generated 2D lattice, and 1 × 105 Monte Carlo trials. The computed uncertainties were all in the nm range. Development of the model will continue, with the goal of evaluating uncertainty for a measurand such as grating pitch or step height. ...
 
Keywords
metrologia mittaus epävarmuus pinnat metrology measurement uncertainty surfaces
URI

http://urn.fi/URN:NBN:fi:jyu-201902191567

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