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dc.contributor.authorKinnunen, Sami
dc.contributor.authorMalm, Jari
dc.contributor.authorArstila, Kai
dc.contributor.authorLahtinen, Manu
dc.contributor.authorSajavaara, Timo
dc.date.accessioned2017-11-14T11:22:51Z
dc.date.available2017-11-14T11:22:51Z
dc.date.issued2017
dc.identifier.citationKinnunen, S., Malm, J., Arstila, K., Lahtinen, M., & Sajavaara, T. (2017). Characterization of ALD grown TixAlyN and TixAlyC thin films. <i>Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms</i>, <i>406</i>(Part A), 152-155. <a href="https://doi.org/10.1016/j.nimb.2016.12.032" target="_blank">https://doi.org/10.1016/j.nimb.2016.12.032</a>
dc.identifier.otherCONVID_26539941
dc.identifier.otherTUTKAID_72937
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/55870
dc.description.abstractAtomic layer deposition (ALD) was used to grow TixAlyN and TixAlyC thin films using trimethylaluminum (TMA), titanium tetrachloride and ammonia as precursors. Deposition temperature was varied between 325 °C and 500 °C. Films were also annealed in vacuum and N2-atmosphere at 600–1000 °C. Wide range of characterization methods was used including time-of-flight elastic recoil detection analysis (ToF-ERDA), X-ray diffractometry (XRD), X-ray reflectometry (XRR), Raman spectroscopy, ellipsometry, helium ion microscopy (HIM), atomic force microscopy (AFM) and 4-point probe measurement for resistivity. Deposited films were roughly 100 nm thick and contained mainly desired elements. Carbon, chlorine and hydrogen were found to be the main impurities.
dc.language.isoeng
dc.publisherElsevier B.V.
dc.relation.ispartofseriesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
dc.subject.otherALD
dc.subject.otherMAX-phases
dc.subject.otherToF-ERDA
dc.titleCharacterization of ALD grown TixAlyN and TixAlyC thin films
dc.typearticle
dc.identifier.urnURN:NBN:fi:jyu-201710254061
dc.contributor.laitosFysiikan laitosfi
dc.contributor.laitosKemian laitosfi
dc.contributor.laitosDepartment of Physicsen
dc.contributor.laitosDepartment of Chemistryen
dc.contributor.oppiaineFysiikkafi
dc.contributor.oppiaineEpäorgaaninen ja analyyttinen kemiafi
dc.contributor.oppiainePhysicsen
dc.contributor.oppiaineInorganic and Analytical Chemistryen
dc.type.urihttp://purl.org/eprint/type/JournalArticle
dc.date.updated2017-10-25T06:15:04Z
dc.type.coarjournal article
dc.description.reviewstatuspeerReviewed
dc.format.pagerange152-155
dc.relation.issn0168-583X
dc.relation.numberinseriesPart A
dc.relation.volume406
dc.type.versionsubmittedVersion
dc.rights.copyright© 2017 Elsevier Ltd. This is a pre-print version of an article whose final and definitive form has been published by Elsevier. Published in this repository with the kind permission of the publisher.
dc.rights.accesslevelopenAccessfi
dc.relation.doi10.1016/j.nimb.2016.12.032


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