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dc.contributor.authorKoivisto, Hannu
dc.contributor.authorKalvas, Taneli
dc.contributor.authorTarvainen, Olli
dc.contributor.authorKomppula, Jani
dc.contributor.authorLaulainen, Janne
dc.contributor.authorKronholm, Risto
dc.contributor.authorRanttila, Kimmo
dc.contributor.authorTuunanen, Juha
dc.contributor.authorThuillier, T.
dc.contributor.authorXie, D.
dc.contributor.authorMachicoane, G.
dc.date.accessioned2016-06-03T10:17:42Z
dc.date.available2016-11-11T22:45:06Z
dc.date.issued2016
dc.identifier.citationKoivisto, H., Kalvas, T., Tarvainen, O., Komppula, J., Laulainen, J., Kronholm, R., Ranttila, K., Tuunanen, J., Thuillier, T., Xie, D., & Machicoane, G. (2016). Ion source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities. <i>Review of Scientific Instruments</i>, <i>87</i>(2), Article 02A725. <a href="https://doi.org/10.1063/1.4934687" target="_blank">https://doi.org/10.1063/1.4934687</a>
dc.identifier.otherCONVID_25288286
dc.identifier.otherTUTKAID_67752
dc.identifier.urihttps://jyx.jyu.fi/handle/123456789/50087
dc.description.abstractSeveral ion source related research and development projects are in progress at the Department of Physics, University of Jyväskylä (JYFL). The work can be divided into investigation of the ion sourceplasma and development of ion sources,ion beams, and diagnostics. The investigation covers the Electron Cyclotron Resonance Ion Source (ECRIS) plasma instabilities, vacuum ultraviolet (VUV) and visible light emission, photon induced electron emission, and the development of plasma diagnostics. The ion source development covers the work performed for radiofrequency-driven negative ion source, RADIS, beam line upgrade of the JYFL 14 GHz ECRIS, and the development of a new room-temperature-magnet 18 GHz ECRIS, HIISI.
dc.language.isoeng
dc.publisherAmerican Institute of Physics
dc.relation.ispartofseriesReview of Scientific Instruments
dc.subject.otherelectron cyclotron resonance ion sources
dc.subject.otherplasma diagnostics
dc.subject.otherbeam intensity
dc.titleIon source research and development at University of Jyväskylä: Studies of different plasma processes and towards the higher beam intensities
dc.typearticle
dc.identifier.urnURN:NBN:fi:jyu-201606032845
dc.contributor.laitosFysiikan laitosfi
dc.contributor.laitosDepartment of Physicsen
dc.contributor.oppiaineKiihdytinlaboratoriofi
dc.contributor.oppiaineAccelerator Laboratoryen
dc.type.urihttp://purl.org/eprint/type/JournalArticle
dc.date.updated2016-06-03T09:15:20Z
dc.type.coarhttp://purl.org/coar/resource_type/c_2df8fbb1
dc.description.reviewstatuspeerReviewed
dc.relation.issn0034-6748
dc.relation.numberinseries2
dc.relation.volume87
dc.type.versionpublishedVersion
dc.rights.copyright© 2015 AIP Publishing. Published in this repository with the kind permission of the publisher.
dc.rights.accesslevelopenAccessfi
dc.relation.doi10.1063/1.4934687
dc.type.okmA1


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