Yang, Jun; Bahrami, Amin; Ding, Xingwei; Zhao, Panpan; He, Shiyang; Lehmann, Sebastian; Laitinen, Mikko; Julin, Jaakko; Kivekäs, Mikko; Sajavaara, Timo; Nielsch, Kornelius (Wiley-VCH Verlag, 2022)
SbOx thin films are deposited by atomic layer deposition (ALD) using SbCl5 and Sb(NMe2)3 as antimony reactants and H2O and H2O2 as oxidizers at low temperatures. SbCl5 can react with both oxidizers, while no deposition is ...
