Development of MeV ion beam lithography technique for microfluidic applications

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dc.contributor.author Puttaraksa, Nitipon
dc.date.accessioned 2011-10-21T08:10:04Z
dc.date.available 2011-10-21T08:10:04Z
dc.date.issued 2011
dc.identifier.isbn 978-951-39-4267-0
dc.identifier.issn 0075-465X
dc.identifier.other oai:jykdok.linneanet.fi:1185836
dc.identifier.uri http://hdl.handle.net/123456789/36839
dc.identifier.uri http://urn.fi/URN:ISBN:978-951-39-4237-0 en
dc.format.extent verkkoaineisto (136 sivua).
dc.language.iso eng
dc.publisher University of Jyväskylä
dc.relation.ispartofseries Research report / Department of Physics, University of Jyväskylä no. 3/2011.
dc.relation.isversionof ISBN 978-951-39-4266-3
dc.rights openAccess fi
dc.subject.other ionisuihkulitografia
dc.title Development of MeV ion beam lithography technique for microfluidic applications
dc.type Diss. fi
dc.identifier.urn URN:ISBN:978-951-39-4267-0
dc.subject.ysa ionit
dc.subject.kota 114
dc.type.dcmitype Text en
dc.type.ontasot Väitöskirja fi
dc.type.ontasot Doctoral dissertation en
dc.contributor.tiedekunta Matemaattis-luonnontieteellinen tiedekunta fi
dc.contributor.tiedekunta Faculty of Mathematics and Science en
dc.contributor.yliopisto University of Jyväskylä en
dc.contributor.yliopisto Jyväskylän yliopisto fi
dc.contributor.oppiaine fysiikka fi

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