Development of MeV ion beam lithography technique for microfluidic applications

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dc.contributor.author Puttaraksa, Nitipon
dc.date.accessioned 2011-10-21T08:10:04Z
dc.date.available 2011-10-21T08:10:04Z
dc.date.issued 2011
dc.identifier.isbn 978-951-39-4267-0
dc.identifier.uri http://hdl.handle.net/123456789/36839
dc.identifier.uri http://urn.fi/URN:ISBN:978-951-39-4237-0 en
dc.format.extent Verkkokirja (136 s.).
dc.language.iso eng
dc.publisher University of Jyväskylä
dc.relation.ispartofseries Research report / Department of Physics, University of Jyväskylä;0075-465X ;no. 3/2011
dc.relation.isversionof ISBN 978-951-39-4266-3
dc.subject.other ionisuihkulitografia
dc.title Development of MeV ion beam lithography technique for microfluidic applications
dc.type Diss. fi
dc.identifier.urn URN:ISBN:978-951-39-4267-0
dc.subject.ysa ionit
dc.subject.kota 114
dc.type.dcmitype Text en
dc.type.ontasot Väitöskirja fi
dc.type.ontasot Doctoral dissertation en
dc.contributor.tiedekunta Matemaattis-luonnontieteellinen tiedekunta fi
dc.contributor.tiedekunta Faculty of Mathematics and Science en
dc.contributor.yliopisto University of Jyväskylä en
dc.contributor.yliopisto Jyväskylän yliopisto fi

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