MeV ion beam lithography of high aspect ratio structures with a focused or aperture-shaped beam for applications in biomedical studies and microfluidics

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dc.contributor.author Gorelick, Sergey
dc.date.accessioned 2008-09-16T10:38:08Z
dc.date.available 2008-09-16T10:38:08Z
dc.date.issued 2008
dc.identifier.isbn 978-951-39-3318-0
dc.identifier.issn 0075-465X
dc.identifier.other oai:jykdok.linneanet.fi:1069270
dc.identifier.uri http://urn.fi/URN:ISBN:978-951-39-3318-0
dc.identifier.uri http://hdl.handle.net/123456789/18901
dc.description.abstract   en
dc.format.extent 65 sivua
dc.language.iso eng
dc.publisher University of Jyväskylä
dc.relation.ispartofseries Research report / Department of Physics, University of Jyväskylä 9/2008.
dc.relation.isversionof ISBN 978-951-39-3317-3
dc.rights openAccess fi
dc.title MeV ion beam lithography of high aspect ratio structures with a focused or aperture-shaped beam for applications in biomedical studies and microfluidics
dc.type Diss. fi
dc.identifier.urn URN:ISBN:978-951-39-3318-0
dc.subject.ysa fysiikka
dc.subject.kota 114
dc.type.dcmitype Text en
dc.type.ontasot Väitöskirja fi
dc.type.ontasot Doctoral dissertation en
dc.contributor.tiedekunta Matemaattis-luonnontieteellinen tiedekunta fi
dc.contributor.tiedekunta Faculty of Mathematics and Science en
dc.contributor.yliopisto University of Jyväskylä en
dc.contributor.yliopisto Jyväskylän yliopisto fi
dc.contributor.oppiaine fysiikka fi

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